Physical vapor deposition (PVD) is a vacuum deposition method used to produce thin films by the condensation of vaporized material onto a substrate. It involves physical processes, such as thermal evaporation or sputtering, where materials transition from solid or liquid to vapor and then back to a solid state on the surface of the substrate. PVD techniques are essential for creating coatings that enhance the properties of materials, such as hardness, corrosion resistance, and optical characteristics.
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